| Topic | Author |
| Assignment: Questions/Thoughts? | Ashish Gupta (13) |
| Introduction — processes and variation framework: Questions/Thoughts? | Ashish Gupta (13) |
| Semiconductor process variation: Questions/Thoughts? | Ashish Gupta (13) |
This course explores statistical modeling and control in manufacturing processes. Topics include the use of experimental design and response surface modeling to understand manufacturing process physics, as well as defect and parametric yield modeling and optimization. Various forms of process control, including statistical process control, run by run and adaptive control, and real-time feedback control, are covered. Application contexts include semiconductor manufacturing, conventional metal and polymer processing, and emerging micro-nano manufacturing processes.
Instructor: Duane Boning
Source: MIT OpenCourseWare
License: Creative Commons BY-NC-SA
Donations: Donate to MIT
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